The research of micro–nano laser patterning system based on digital micromirror device

Abstract

This article presents the properties of the micro-nano sacle laser patterning system based on digital micromirror device. The introduction of the excellent spatial light modulator-digital micromirror device-provides a possibility for the patterning system to combine high resolution and accuracy with short writing time. The optical characteristics of the digital micromirror device-input imaging system are analyzed. An overlapping exposure method is proposed to obtain optical resolution enhancement and high fidelity of the input pattern. Based on this method, an optical synthetic-aperture effect is realized without increasing the system complexity or decreasing the process efficiency.