Ga2O3 as an ultrawide band gap
semiconductor
has attracted much attention in high-power electronic applications,
but its full potential and functionalities have been hampered by its
inability to obtain reliable p-type materials. Previously,
we demonstrated p-type Ga2O3 by alloying with NiO in an O-rich environment (Ni
x
Ga1–x
O1+δ). This is attributed to the >1.8 eV upward movement of the valence
band maximum (VBM) when the alloy forms a rocksalt structure for x ≳ 0.2, making the Ni vacancy (V
Ni) acceptors to become shallow. Here, we improve the p-type conductivity of Ni
x
Ga1–x
O1+δ by extrinsic p-type doping with Li by magnetron sputtering. While stoichiometric
Ni
x
Ga1–x
O alloys are highly resistive throughout the whole composition range,
Li-doped Ni
x
Ga1–x
O exhibits p-type conductivity with x > 0.4, confirming that despite the lack of a high V
Ni concentration, Li is an effective acceptor
in RS-Ni
x
Ga1–x
O. The doping efficiency of Li is further improved in O-rich
alloys Ni
x
Ga1–x
O1+δ due to the enhanced incorporation of
Li, so that p-type conducting Ni
x
Ga1–x
O1+δ:Li alloys with Ni composition as low as x ∼
0.2 is achieved. With Li doping, the ρ of Ni-rich alloys with x > 0.5 is <10 Ω·cm, which is over an order
of magnitude lower than that in undoped alloys. The enhanced p-type conductivity of Ni
x
Ga1–x
O1+δ:Li is in good
agreement with the position of their Fermi level with respect to the
VBM, as revealed by VB spectra from X-ray photoelectron spectroscopy
measurements. With further optimization of the doping concentration,
these p-type Ni
x
Ga1–x
O1+δ:Li films can
be exploited to form p–n junction structures on n-type Ga2O3.