The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition

O’Connor, Robert; Armini, Silvia; Selvaraju, V.; Pasquali, Mattia; Hughes, Greg; Bogan, J.

doi:10.1016/j.apsusc.2022.152679

Cited by 8 publications

(4 citation statements)

References 57 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…After survey ten, the F 1s content was still 16.2%, showing that any decrease happens during the initial exposure. This points to the desorption of any unreacted I-PFC12 molecules from the deposition process that may be present on the surface [ 47 ]. Once these molecules have been removed, the I-PFC12 SAMs are stable, even after more than two hours of exposure to X-rays.…”

Section: Resultsmentioning

confidence: 99%

Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light

Colbeck Kirby,

Lodha,

Astley

et al. 2024

Nanomaterials

View full text Add to dashboard Cite

Perfluorododecyl iodide (I-PFC12) is of interest for area-selective deposition (ASD) applications as it exhibits intriguing properties such as ultralow surface energy, the ability to modify silicon’s band gap, low surface friction, and suitability for micro-contact patterning. Traditional photolithography is struggling to reach the required critical dimensions. This study investigates the potential of using I-PFC12 as a way to produce contrast between the growth area and non-growth areas of a surface subsequent to extreme ultraviolet (EUV) exposure. Once exposed to EUV, the I-PFC12 molecule should degrade with the help of the photocatalytic substrate, allowing for the subsequent selective deposition of the hard mask. The stability of a vapor-deposited I-PFC12 self-assembled monolayer (SAM) was examined when exposed to ambient light for extended periods of time by using X-ray photoelectron spectroscopy (XPS). Two substrates, SiO2 and TiO2, are investigated to ascertain the suitability of using TiO2 as a photocatalytic active substrate. Following one month of exposure to light, the atomic concentrations showed a more substantial fluorine loss of 10.2% on the TiO2 in comparison to a 6.2% loss on the SiO2 substrate. This more pronounced defluorination seen on the TiO2 is attributed to its photocatalytic nature. Interestingly, different routes to degradation were observed for each substrate. Reference samples preserved in dark conditions with no light exposure for up to three months show little degradation on the SiO2 substrate, while no change is observed on the TiO2 substrate. The results reveal that the I-PFC12 SAM is an ideal candidate for resistless EUV lithography.

show abstract

Section: Resultsmentioning

confidence: 99%

Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light

Colbeck Kirby,

Lodha,

Astley

et al. 2024

Nanomaterials

View full text Add to dashboard Cite

show abstract

“…S1†); we provide 95% confidence intervals for each parameter to identify statistically significant differences before and after storage. After 7 days storage at room temperature under buffer, between 50–80% of the initial packing density remains, with neither the addition of 6-mercapto-1-hexanol, which we introduced in the expectation that it might reverse monolayer desorption, 33–35 nor the removal of oxygen, which we expected might reduce oxidative desorption of the SAM, 36–39 improving aptamer retention (Fig. 2).…”

Section: Resultsmentioning

confidence: 99%

Effects of storage conditions on the performance of an electrochemical aptamer-based sensor

Chung,

Billante,

Flatebo

et al. 2024

Sens. Diagn.

View full text Add to dashboard Cite

show abstract

“…Meanwhile, the presence of C=O groups on the PET surface contributes to the facilitation of ALD growth during the first few ALD cycles in order to create the initial closed ALD layer. After the space between the polymer chains is completely closed, the TDMAT and H PET is a semi-crystalline polymer having surface groups that are responsive to ALD nucleation of C=O polar groups [23,24], allowing the polymer backbone to show Lewis base properties and making the polymer surface reactive during precursor exposure, resulting in a strong Lewis acid [25][26][27]. By exposing the carbonyl site of C=O, coordinating with the precursor (i.e.…”

Section: Resultsmentioning

confidence: 99%

The growth mechanisms of TiO₂ film onto PET surfaces by atomic layer deposition

Riyanto,

Dedi,

Fudholi

et al. 2023

Mater. Res. Express

View full text Add to dashboard Cite

Atomic layer deposition (ALD) was used to coat a polyethylene terephthalate (PET) polymer substrate with TiO2 film. The TiO2 was grown onto the surface with better film coverage by using thicker ALD deposition. Further evaluation on the coated substrates indicated that the reactive sites of –C=O that existed on PET surface played a significant contribution to facilitating the initial ALD growth of the TiO2 thin film. The chemical composition of the coated substrates was characterised using energy dispersive X-ray spectroscopy, which showed that increasing the TiO2 film thickness increased the Ti element content. Two growth mechanisms, namely, diffusion growth and direct coordination through the ligand exchange coordination with surface reactive sites of –C=O with methane release occurred simultaneously in the initial growth of TiO2 coating onto PET polymer by ALD. The surface alteration of the coated ALD was characterised by Fourier transform infrared spectroscopy, which showed that the hydroxyl –OH groups emerged in the TiO2 ALD film.

show abstract

The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition

Cited by 8 publications

References 57 publications

Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light

Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light

Effects of storage conditions on the performance of an electrochemical aptamer-based sensor

The growth mechanisms of TiO₂ film onto PET surfaces by atomic layer deposition

Contact Info

Product

Resources

About

The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition

Cited by 8 publications

References 57 publications

Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light

Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light

Effects of storage conditions on the performance of an electrochemical aptamer-based sensor

The growth mechanisms of TiO2 film onto PET surfaces by atomic layer deposition

Contact Info

Product

Resources

About

The growth mechanisms of TiO₂ film onto PET surfaces by atomic layer deposition