The role of substrate temperature on the properties of nanocrystalline Mo doped ZnO thin films by spray pyrolysis

Swapna, R.; Kumar, M.C. Santhosh

doi:10.1016/j.ceramint.2012.01.039

Cited by 61 publications

(24 citation statements)

References 31 publications

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“…Even though zinc oxide can have two other crystalline structures-zinc-blende and rocksalt-, the high polarity of the Zn-O bond accounts for the preferential formation of wurtzite rather than zinc-blende, which is metastable, or rocksalt, which can only be obtained at high pressures. In the wurtzite crystal structure, hexagonal-close-packed (hcp) M. VERDE [15], RF magnetron sputtering [16], spray pyrolysis [17], metal organic chemical vapor deposition (MOCVD) [18] or pulsed laser deposition (PLD) [19]. Nevertheless, these techniques present important drawbacks, such as the high energy consumption and sophisticated instrumentation required for the transformation of the Zn precursors to the gas state, which increase their cost and make them hardly scalable.…”

Section: Introductionmentioning

confidence: 99%

EPD-deposited ZnO thin films: a review

Verde¹

2014

Bol. Soc. Esp. Ceram. Vidr.

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Section: Introductionmentioning

confidence: 99%

EPD-deposited ZnO thin films: a review

Verde¹

2014

Bol. Soc. Esp. Ceram. Vidr.

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“…6. Moreover, n = 1/2 is a better fit, which shows the direct transition of the electron in the ZnO and Mo:ZnO films [33][34][35], and the resultant energy gap is 3.11 eV.…”

Section: Optical Propertiesmentioning

confidence: 99%

“…Because the films were deposited at lower substrate temperatures, the reactivity between Mo and ZnO was low. Simultaneously, the higher sputtering pressure that scattered the reacting species reduced the doping of the appropriate at.% of Mo in the Zn site [33].…”

Section: Optical Propertiesmentioning

confidence: 99%

Physical investigations on transparent conducting Mo:ZnO thin films

Srinivasarao

Mohanbabu²,

Mukhopadhyay

2018

Adv Compos Hybrid Mater

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Molybdenum (Mo)-doped zinc oxide (ZnO) thin films were deposited by radio frequency (r.f.) magnetron sputtering on quartz and Si (100) substrates at two different substrate temperatures (473 and 673 K) and at a fixed combined partial pressure 5 Pa of Argon and O 2 . The atomic percentage (at.%) of (Mo) in ZnO was increased from 1 to 2 at.%. The results of X-ray diffraction revealed that the ZnO films deposited at 5 Pa at a substrate temperature of 473 K were highly c-axis oriented with a predominant (002) crystallographic orientation. The intensity of (002) decreased with an increase in the atomic percentage of Mo. Moreover, a growth in the (100), (101), (220), and (103) orientations was observed. The energy-dispersive spectrum (EDS) of the Mo:ZnO films deposited at 5 Pa and 473 K was substoichiometric, whereas the films deposited at 673 K were nearly stoichiometric. The surface morphology of the ZnO films is porous when deposited at 473 K. The optical energy gap of the ZnO films deposited at 473 K increased from 3.11 to 3.64 eV with an increase in the atomic percentage of Mo. The electrical resistivity of the ZnO films decreased from 1.7 × 10 −4 to 6.7 × 10 −5 Ωm with an increase in the substrate temperature and atomic percentage of Mo. The thickness of the films measured by spectroscopic ellipsometry is 440 nm.

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“…Also the crystallographic (002) peak becomes broad with increasing molybdenum concentration. The literature reveals that the reduction in the intensity of the crystallographic peak is attributed to the reduction in the crystallinity of the films [19,20]. The crystallite size of the SILAR deposited Mo doped ZnO thin films has been calculated using Scherer formula [21] given in equation (1), and the average lattice strain has been calculated using Stokes Wilson equation [22] shown in equation (2), The FWHM values of the samples were derived from their highest intensity peak broadening by pseudo-voigt peak fitting.…”

Section: Structural Analysismentioning

confidence: 99%

“…Among these methods SILAR method only having more advantages like, large-scale deposition in glass and metal substrates, commercial-grade production in non-vacuum conditions at low temperatures and low cost [16]. In the present work the Mo doped ZnO films were deposited for various molar ratios of Mo and Zn (1:10, 1:15 and 1: 20) and in the present investigation, the effect of Mo doping on various physical properties like structure, surface morphology, optical properties and electrical properties of ZnO thin films was studied in detail.…”

Section: Introductionmentioning

confidence: 99%