With
the demand for high-performance and miniaturized semiconductor
devices continuously rising, the development of innovative tunneling
transistors via efficient stacking methods using two-dimensional (2D)
building blocks has paramount importance in the electronic industry.
Hence, 2D semiconductors with atomically thin geometries hold significant
promise for advancements in electronics. In this study, we introduced
tunneling memtransistors with a thin-film heterostructure composed
of 2D semiconducting MoS2 and WSe2. Devices
with the dual function of tuning and memory operation were realized
by the gate-regulated modulation of the barrier height at the heterojunction
and manipulation of intrinsic defects within the exfoliated nanoflakes
using solution processes. Further, our investigation revealed extensive
edge defects and four distinct defect types, namely monoselenium vacancies,
diselenium vacancies, tungsten vacancies, and tungsten adatoms, in
the interior of electrochemically exfoliated WSe2 nanoflakes.
Additionally, we constructed complementary metal-oxide semiconductor-based
logic-in-memory devices with a small static power in the range of
picowatts using the developed tunneling memtransistors, demonstrating
a promising approach for next-generation low-power nanoelectronics.