2022
DOI: 10.1016/j.ijleo.2022.169427
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The role of various etching time in Si nanostructures for ultra-high sensitivity photodetector

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Cited by 17 publications
(1 citation statement)
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“…Since most current integrated circuits are manufactured on Si substrates, one of the proposed solutions is to combine the sophisticated microelectronics with optoelectronics technologies to achieve Si-based single-chip photoelectric integration circuits with photons as information carriers. Many other processes in Si-based monolithic optoelectronic integration are more mature [ 1 , 2 , 3 , 4 , 5 ], and the greatest limitation is the lack of suitable light sources.…”
Section: Introductionmentioning
confidence: 99%
“…Since most current integrated circuits are manufactured on Si substrates, one of the proposed solutions is to combine the sophisticated microelectronics with optoelectronics technologies to achieve Si-based single-chip photoelectric integration circuits with photons as information carriers. Many other processes in Si-based monolithic optoelectronic integration are more mature [ 1 , 2 , 3 , 4 , 5 ], and the greatest limitation is the lack of suitable light sources.…”
Section: Introductionmentioning
confidence: 99%