“…However, there are problems related to the design of the optical projection sys tem, due to the fact that the absorption coefficient of most materials in the VUV is large, yet, their optical properties degrade constantly with time under VUV irradiation. Up to now, only calcium fluoride seems to be promising as optical material for 157 nm photolithography, and the possibility of using wide band gap fluoride dielectric crystals, such as YF 4 and LiCaAlF 6 , as optical elements for 157 nm photolithography was investigated. These materials could be grown from melts at lower temperature than CaF 2 and they have similar physical proper ties, despite the fact that they are forming crystals of different symmetry than cubic.…”