The Si&lt;sub&gt;3&lt;/sub&gt;N&lt;sub&gt;4&lt;/sub&gt; Liner Stressor for Performance Improvement of Tensile-Strained GeSn/SiGeSn Multiple Quantum Well Laser

Fang, Chengcheng; Liu, Y.; Gao, Xujiao; Han, Geng; Zhang, Q.; Shao, Yongbo; Zhang, J.; Hao, Yongqiang

doi:10.7567/ssdm.2018.ps-5-09

Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials 2018

DOI: 10.7567/ssdm.2018.ps-5-09

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The Si<sub>3</sub>N<sub>4</sub> Liner Stressor for Performance Improvement of Tensile-Strained GeSn/SiGeSn Multiple Quantum Well Laser

Chengcheng Fang¹,

Y. Liu²,

Xujiao Gao³

et al.

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The Si<sub>3</sub>N<sub>4</sub> Liner Stressor for Performance Improvement of Tensile-Strained GeSn/SiGeSn Multiple Quantum Well Laser

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