Abstract:With the resistive random access memory (ReRAM) devices based on the Al/BaTiO3 (BTO)/ITO structure fabricated at hand, by cross-analyzing the resistive memory characteristics in terms of various barium titanate (BTO) film thicknesses, it is found that the device with 60 nm thick BTO can be switched more than 425 times, while the corresponding SET/RESET voltage, the on-off ratio, and the retention time are −0.69 V/0.475 V, 102, and more than 104 seconds, respectively. Furthermore, the aforementioned ReRAM with … Show more
“…Similarly, new structures could be used to enhance the performance of resistive memories and electro-optic (EO) modulators. The effect of the barium carbonate film thickness on the performance of resistive memories was studied; then, a parallel dual microdisks memory resonator was proposed [ 27 ]. A two-port network was constructed by the parallel alignment of resistance memory components and bus waveguides.…”
Optoelectronic devices are fabricated based on an optoelectronic conversion effect, which is a developing research field of modern optoelectronic technology and microelectronics technology [...]
“…Similarly, new structures could be used to enhance the performance of resistive memories and electro-optic (EO) modulators. The effect of the barium carbonate film thickness on the performance of resistive memories was studied; then, a parallel dual microdisks memory resonator was proposed [ 27 ]. A two-port network was constructed by the parallel alignment of resistance memory components and bus waveguides.…”
Optoelectronic devices are fabricated based on an optoelectronic conversion effect, which is a developing research field of modern optoelectronic technology and microelectronics technology [...]
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