2013
DOI: 10.1016/j.matlet.2013.02.005
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The spreading kinetics and precursor film characteristics of Zr-based alloy melt on W substrate

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Cited by 15 publications
(4 citation statements)
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“…Given the advantage on interface study, sessile drop method262728 was introduced to research the effect of elements addition. The differential scanning calorimetry (DSC) results of V, VNb5 and VTa5 alloys indicates that the liquidus temperatures are 990 ± 5 K. Therefore, the alloys were heated to 1273 K on W substrates and held for 30 min.…”
Section: Resultsmentioning
confidence: 99%
“…Given the advantage on interface study, sessile drop method262728 was introduced to research the effect of elements addition. The differential scanning calorimetry (DSC) results of V, VNb5 and VTa5 alloys indicates that the liquidus temperatures are 990 ± 5 K. Therefore, the alloys were heated to 1273 K on W substrates and held for 30 min.…”
Section: Resultsmentioning
confidence: 99%
“…Such a congruent relationship is also suitable for the wetting of metal/ceramic systems [4]. Also, in all Al/TC4 and Al/ TA2 (except for Al 6061/TA2 at 600°C which is nonwetting at the final state), the precursor film can be found at the final state after wetting, also can be seen in Hg/ Ag system [5] in the study by Be'er et al However, the formation mechanism is so different from the evaporation-condensation mechanism (suggested by de Gennes [6]) and the surface diffusion mechanism (suggested by Li et al [7]). Further, the precursor film, in a metal/ceramic system, especially for the melt contain some concentration of the active element, is an adsorbed film.…”
Section: Reactive Wetting Of Al Alloys On Metallic Substratesmentioning
confidence: 88%
“…Molecularly thin precursor films have been discovered in many high temperature metal/metal systems. 16–19 Webb and co-workers were the first to determine the dynamic characteristics of metallic precursor films by comparing their spreading dynamics with the scaling law of R ( t ) ∼ t n . 20 The satisfaction of R ( t ) ∼ t 1/2 indicates that the precursor film moves via diffusion.…”
Section: Introductionmentioning
confidence: 99%