The stability of nitrogen-containing amorphous carbon films after annealing at moderate temperatures

Burden, A.P.; Mendoza, E.; Silva, S. Ravi P.; Amaratunga, G.A.J.

doi:10.1016/s0925-9635(97)00243-4

Cited by 18 publications

(8 citation statements)

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“…This effect has been previously attributed to bond reordering within the films, giving rise to possible sp 2 cluster formation. 18 Annealing at higher temperatures causes a further increase in the refractive index and a further significant decrease in the band gap, which suggests graphitization of the film.…”

Section: Resultsmentioning

confidence: 99%

“…18 The E 04 value of the band gap of the films was improved by annealing the films at 100°C for 300 s. The change in the E 04 value resulting from this anneal is plotted in Fig. 2 against the nitrogen flow rate for the different films.…”

Section: Resultsmentioning

confidence: 99%

“…The increase of the band gap is attributed to a decrease in the defect density of the film. 18,25 This will be examined more carefully in a subsequent study of the ESR properties of these films. Note that the above anneal causes a decrease in the band gap of the non-nitrogenated film and to the film grown with 2.5 sccm of nitrogen.…”

Section: Resultsmentioning

confidence: 99%

“…Fourier transform infrared ͑FTIR͒ spectroscopy has historically been a preferred tool for the characterization of a-C:H:͑N) films, and its use has given rise to an extensive amount of work reported in the literature over the last two decades, 5,13,[18][19][20][21][22][23][24] and is used in this study.…”

Section: Introductionmentioning

confidence: 99%

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Thermal stability of plasma deposited thin films of hydrogenated carbon–nitrogen alloys

Anguita

Silva

Burden

et al. 1999

Journal of Applied Physics

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The need to grow high quality semiconducting hydrogenated amorphous carbon (a-C:H) thin films to allow n-type electronic doping by nitrogenation has lead us to deposit films with low paramagnetic defect density (1017 cm−3). The films were grown on the earthed electrode of a radio frequency driven plasma enhanced chemical vapor deposition system using methane, helium and a range of nitrogen concentrations as the precursor gases. The deposited films are shown to be polymer like. Changes in the chemical structure and relative bond fractions as a function of the nitrogen flow rate into the plasma chamber and ex situ annealing are reported. Particular attention is paid to changes in the film structure after annealing at 100 °C, since an increase in the E04 optical band gap is observed as a function of nitrogen flow after the anneal. This suggests a decrease in the defect density of the film.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Thermal stability of plasma deposited thin films of hydrogenated carbon–nitrogen alloys

Anguita

Silva

Burden

et al. 1999

Journal of Applied Physics

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“…12 Unlike silicon, it is carbon's ability to hybridize as sp 1 , sp 2 , or sp 3 bonds that makes the family of a-C:H films so interesting and varied. Similarly, the PECVD generated carbonaceous dust also exhibits a wide variety of structures that may be of significant interest to the fullerene community based on a cheaper and more widely available technology.…”

mentioning

confidence: 99%

Fullerene and nanotube formation in cool terrestrial “dusty plasmas”

Burden

Silva

1998

Applied Physics Letters

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The simultaneous generation of dust during the deposition of semiconducting thin films by radio frequency plasma enhanced chemical vapor deposition has so far been regarded as a troublesome by-product. However, we present results from recent microstructural investigations of carbonaceous dust particles from a methane precursor that demonstrate that the technique may be suited to generating fullerene molecules, nanotubes, and nanoparticles. Chemical analysis reveals that these particles contain few contaminant species, and we deduce that they nucleated in the plasma, with the carbon ions possibly self-arranging through the action of coulombic forces.

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