2009
DOI: 10.1016/j.diamond.2008.11.033
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The structural and electrochemical properties of boron-doped nanocrystalline diamond thin-film electrodes grown from Ar-rich and H2-rich source gases

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Cited by 99 publications
(70 citation statements)
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“…Th e results reveal that the Ti/BDD electrodes have a wide range of working potential stability to water. Th e values obtained for the working potential window of Ti/BDD electrodes are around of 3.0 V. Th is value is comparable to those in the literature for diamond deposited on silicon substrates (25)(26)(27) . Th e advantage of the diamond electrode is the fact that it allows the detection of redox reactions in certain potentials that would be outside the range of work potential of conventional electrodes.…”
Section: Resultssupporting
confidence: 77%
“…Th e results reveal that the Ti/BDD electrodes have a wide range of working potential stability to water. Th e values obtained for the working potential window of Ti/BDD electrodes are around of 3.0 V. Th is value is comparable to those in the literature for diamond deposited on silicon substrates (25)(26)(27) . Th e advantage of the diamond electrode is the fact that it allows the detection of redox reactions in certain potentials that would be outside the range of work potential of conventional electrodes.…”
Section: Resultssupporting
confidence: 77%
“…Nano-and poly-crystalline CVD diamond films, however, show complex bands with scattering intensity reaching from 1,100-1,600 cm À 1 (ref. 40). These lines are assigned to various constituents such as sp 2 -bonded carbons, diamond progenitors, amorphous carbon and so on.…”
Section: Methodsmentioning
confidence: 99%
“…Several solutions were prepared with different concentrations of B 2 O 3 dissolved in CH 3 OH of 2,000, 5,000, 10,000, 20,000 and 30,000 ppm of boron atoms in relation to the carbon atoms of the CH 3 OH (B/C ratios). The volume of CH 3 OH was fixed at 200 mL for all solutions. These boron doping levels correspond to the acceptor density values that varied from 10 20 to 10 21 B.cm −3 as the doping level increased evaluated by Raman spectra (not shown).…”
Section: Methodsmentioning
confidence: 99%
“…The diamond films depositions were performed with the HFCVD technique using the following growth parameters: temperature of 900 K, pressure of 6.7 kPa, 16-hour deposition time and gas mixture of CH 4 3 B is produced, which is probably the substance containing boron that is added to the gas mixture during the growth process. Several solutions were prepared with different concentrations of B 2 O 3 dissolved in CH 3 OH of 2,000, 5,000, 10,000, 20,000 and 30,000 ppm of boron atoms in relation to the carbon atoms of the CH 3 OH (B/C ratios).…”
Section: Methodsmentioning
confidence: 99%
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