The Structural and Optical Properties of Nanocrystalline Fe3O4 Thin Films Prepared by PLD

Abdulkareem, Khalid Ali; Kadhim, Suad; Shams, Ali

doi:10.30684/etj.v40i2.2235

Cited by 7 publications

(3 citation statements)

References 17 publications

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“…Structural properties, including lattice constants, were determined for the cubic structure [15]. The dislocation density (δ) was determined using Smallman's relation [16], and the specific surface area (SSA) was calculated as SSA = 6000/(D.ρ), where D is the crystallite size and ρ is the density of CdTe (5.85 g/cm 3 ) [17].…”

Section: Methodsmentioning

confidence: 99%

Morphological, Optical, and Electrical Studies of PVD CdTe Thin Films for Photovoltaic Applications

Ebtehaj F. Jassem,

Shams B. Ali,

Soad M. Kadhim

2024

IJNeaM

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Nano-crystalline CdTe films were coated on glass and silicon substrates using the vacuum evaporation (PVD) technique, with annealing temperatures of 25, 100, 150, and 200 °C. This study aims to create a simple photoelectric cell using the effective light-absorbing layer CdTe as a thin film and Si as an n-type semiconductor. Additionally, it investigates the properties of CdTe thin films annealed at various temperatures. The following equipment was used: XRD, UV-visible spectrophotometer, SEM, and AFM. Moreover, the electrical characteristics of the fully designed devices were tested using I-V measurements and the Hall effect. Thin-film photovoltaics could become the primary source of global electricity. The CdTe thin films were coated using thermal evaporation. The best efficiency was 0.99% for the CdTe/Si structure with Voc = 5.0 x 10-1 V, Jsc = 51.0 x 10-2 mA/cm2, FF = 0.39, at 25 °C, and the efficiency decreased with increasing temperature. It has been found that annealing temperatures have an impact on the size of crystallites, the values of energy gaps, and the electrical properties of CdTe thin films.

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Section: Methodsmentioning

confidence: 99%

Morphological, Optical, and Electrical Studies of PVD CdTe Thin Films for Photovoltaic Applications

Ebtehaj F. Jassem,

Shams B. Ali,

Soad M. Kadhim

2024

IJNeaM

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“…The electrical properties were studied by employing Hall effect. Titanium dioxide nanofilms were of (n-type) conductivity, and thus the charge carriers were electrons, resulting from interfacial threads of titanium nano-ions or donor oxygen vacancies [22]. Table (2) and Figure (3) illustrate the main values of Hall effect.…”

Section: -Electrical Properties 3-1 Hall Effectmentioning

confidence: 99%

The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms

Razooqi,

Majeed

2023

Tikrit J. Pure Sci.

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Thin films of titanium dioxide (TiO2) with several copper ratios were deposited on glass substrates using pulsed laser deposition (PLD) for pure and doped samples (TiO2 Pure, 1 % Cu, 2 % Cu, and 3 % Cu), energy (600 mJ), and frequency (6 Hz). X-ray diffraction (XRD) showed that the width of the peaks decreases with increasing the ratio of doping with copper. This leads to an increase in the crystal size and in the intensity of the copper peaks, as well as a gradual decrease in the intensity of the titanium dioxide peaks. The results of the atomic force microscope showed that increasing the inoculation percentage leads to an increase in the surface roughness and the average grain diameter, and thus an increase in the growth of the particle size. The electrical tests (Hall effect) showed that the prepared films are of (n-type) and that the concentration of carriers (n) increased with the doping ratio, while the mobility values (µH) decreased directly with the increase in copper. The electrical conductivity (DC) test showed an increase in the activation energy as a result of the increase in the copper inoculation percentage and thus the electrical conductivity increases.

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“…Al2O3 nanocoatings are widely used as anti-reflective coatings [2], transparent microelectronics [3], and passivation of silicon solar cells [4].Al2O3 nancoating is prepared using different deposition techniques such as pulsed laser deposition (PLD) [3], atomic layer deposition (ALD) [5], and sol-gel [6]. PLD technology is a physical vapor deposition technology (PVD) [7]. PLD technology is characterized by ease of use, high flexibility, and ease of control over the growth of nanocoating [8].…”

Section: Introductionmentioning

confidence: 99%

Multiple-Response Optimization of Aluminum Oxide Nanocoating Prepared by Pulsed Laser Deposition Using Taguchi Design

Hassan

Alwahib

Hussein

2022

DDF

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In this work, an aluminum oxide nanocoating was prepared using the pulsed laser deposition technique to study the properties of the coating and to find the optimal conditions to achieve the highest quality of the aluminum oxide nanocoating. The structural properties were studied using X-ray diffraction. The results showed that the aluminum oxide nanocoatings were alpha phase polycrystalline structures. The surface topography was studied using atomic force microscopy. The surface topography showed that the average surface roughness ranged from 1.26 nm to 7 nm. The optical properties were studied using a UV-VIS spectrometer. It showed the energy gap within the range 4.09 eV to 3.98 eV. The hardness of the aluminum oxide nanocoatings were calculated using the nanoindentation technique and found within the range of 32.79 GPa to 10.41 GPa. According to the present work, the effect of the input parameters represented by the pulse energy and the number of pulses on the responses represented by the energy gap, hardness, and surface roughness were studied. The experiments were designed based on the L9 orthogonal array with the Taguchi approach. A multiple responsive optimizations of Takeuchi's design was done using the desirability function.

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The Structural and Optical Properties of Nanocrystalline Fe3O4 Thin Films Prepared by PLD

Cited by 7 publications

References 17 publications

Morphological, Optical, and Electrical Studies of PVD CdTe Thin Films for Photovoltaic Applications

Morphological, Optical, and Electrical Studies of PVD CdTe Thin Films for Photovoltaic Applications

The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms

Multiple-Response Optimization of Aluminum Oxide Nanocoating Prepared by Pulsed Laser Deposition Using Taguchi Design

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