Ferroelectric poly(vinylidene fluoride) polymer (VDF 2 ) n thin-film formation by a low-pressure chemical vapor polymerization (CVP) process is described. The process involves polymerization of an isotropic vinylidene fluoride monomer condensate layer by cleavage of C double bonds using :CF 2 initiators derived from hot-filament, thermochemical decomposition of the hexafluoropropylene oxide C 3 F 6 O. Two different growth modes on the film surface and in the bulk are identified by Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) studies. Surface impingement of :CF 2 induces lateral growth of molecular chains in trans conformation. Due to the initiation of polymerization at random surface sites, amorphous b-phase growth is also observed. Bulk growth of polymer film involves chain formation dominated by gauche conformations having a predominance of the a-phase. Ferroelectric investigations of (VDF 2 ) n films show spontaneous polarization and hysteresis effects, which improves on crystallization. Typical polarization values of 3.5 and 1.5 lC cm -2 in the planar and normal directions, respectively, are observed after crystallization. Structural defects in the molecular chains give rise to space charge conduction which affects polarization switching properties. The low-pressure CVP technique is compatible with sub-micrometer semiconductor device fabrication and also provides a novel method for incorporating additional functional units into the molecular chains to control the film properties.