1990
DOI: 10.1016/0039-6028(90)90755-w
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The structure of oxygen adsorption phases on Cu(100)

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Cited by 91 publications
(20 citation statements)
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“…A combined normal-emission photoelectron diffraction and near-edge x-ray absorption fine structure ͑NEXAFS͒ study showed that the local adsorption structure of the four-spot pattern was different from that of the (2ͱ2ϫͱ2)R45°structure, and the four-spot phase might be correlated with a local disordered phase. 11 HREELS, 2 x-ray photoemission spectroscopy, 12 and surface-extended x-ray absorption fine structure 13 ͑SEXAFS͒ studies also indicated that the oxygen atoms occupied different adsorption sites at lower coverage, though they did not observe the four-spot LEED pattern in their paper. STM studies suggested also the existence of the disordered phase, 6,8 and Jensen et al 6 explained that the disordered phase is attributed to local breaking of the Cu bonds by oxygen, making local roughening of the surface.…”
Section: Introductionmentioning
confidence: 91%
“…A combined normal-emission photoelectron diffraction and near-edge x-ray absorption fine structure ͑NEXAFS͒ study showed that the local adsorption structure of the four-spot pattern was different from that of the (2ͱ2ϫͱ2)R45°structure, and the four-spot phase might be correlated with a local disordered phase. 11 HREELS, 2 x-ray photoemission spectroscopy, 12 and surface-extended x-ray absorption fine structure 13 ͑SEXAFS͒ studies also indicated that the oxygen atoms occupied different adsorption sites at lower coverage, though they did not observe the four-spot LEED pattern in their paper. STM studies suggested also the existence of the disordered phase, 6,8 and Jensen et al 6 explained that the disordered phase is attributed to local breaking of the Cu bonds by oxygen, making local roughening of the surface.…”
Section: Introductionmentioning
confidence: 91%
“…Contrary to the majority of stepped surfaces, O/Cu(410) is very well ordered, allowing for a precise structural analysis, and it is very stable. It was therefore used as a model to try to understand the (2 √ 2 × √ 2)R45 • structure forming on Cu(100) at 0.5 ML O coverage [292]. In spite of that, the detailed structure of the O/Cu(410) layer remained controversial for a long time (see Ref.…”
Section: O-induced Reconstruction Of Vicinal Cu Surfacesmentioning
confidence: 99%
“…Cu͑100͒ is reactive towards O 2 dissociation, and adsorption of O 2 and oxide formation have been extensively investigated on it by a wide array of techniques: low-energy electron diffraction ͑LEED͒, 8 scanning tunneling microscopy ͑STM͒/LEED, 9-16 molecular beam surface scattering ͑MBSS͒/reflection highenergy electron diffraction ͑RHEED͒/Auger electron spectroscopy ͑AES͒/thermal desorption mass spectrometry ͑TDMS͒/LEED, 17,18 surface stress change by crystal curvature technique/density functional theory ͑DFT͒/LEED, 19 LEED multiple-scattering analysis, 20 time-resolved verylow-energy electron diffraction ͑VLEED͒, 21 spot profile analysis low-energy electron diffraction/helium diffraction ͑HED͒, 22 high-resolution electron energy-loss spectroscopy ͑HREELS͒/LEED/AES, 23 HREELS/x-ray photoelectron spectroscopy ͑XPS͒, [24][25][26] hyperthermal O 2 molecular beam ͑HOMB͒/XPS, 27,28 near edge x-ray absorption fine structure ͑NEXAFS͒, 29 normal-emission photoelectron diffraction/NEXAFS/LEED, 30 surface-extended x-ray absorption fine structure ͑SEXAFS͒, 31 angle-and temperaturedependent SEXAFS, 32 angle-dependent NEXAFS and SEXAFS/LEED/XPS/AES/TDMS, 33 surface x-ray diffraction, 34 in situ synchrotron x-ray scattering, 35 transmission electron microscopy ͑TEM͒, [36][37][38][39][40][41][42][43][44][45] analytical electron microscopy ͑AEM͒, 46,47 and ab initio calculations. [48][49][50][51][52]…”
Section: Introductionmentioning
confidence: 99%