The ternary system titanium-aluminum-nitrogen

Schuster, Julius C.; Bauer, Josef

doi:10.1016/0022-4596(84)90100-2

Cited by 193 publications

(103 citation statements)

References 11 publications

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“…As the temperature was increased to 1300 ºC, Ti 2 AlN became the dominant crystalline phase (96.6 wt%) with 2.7 wt% TiN and 0.7 wt% TiAl 3 . This XRD analysis suggests the following reactions are possible during SPS [9,10,12]:…”

Section: Icdd Data Used Includementioning

confidence: 87%

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Microstructural evolution during high-temperature oxidation of spark plasma sintered Ti2AlN ceramics

et al. 2012

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Section: Icdd Data Used Includementioning

confidence: 87%

“…Al melts at approximately 660 ºC (reaction 1) while reaction between Ti and Al forms Ti-Al intermetallics such as TiAl and TiAl 3 [9,10,12] at approximately 700-900 ºC. Formation of Ti-Al intermetallics has also been found during synthesis of layered ternary ceramics such as Ti 2 AlC [21] and Ti 3 AlC 2 [22].…”

Section: Nanowhisker-containing Microstructuresmentioning

confidence: 99%

Microstructural evolution during high-temperature oxidation of spark plasma sintered Ti2AlN ceramics

et al. 2012

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“…The history of theoretical predictions of new MAX phases begins with the debate on the structure of Ti 4 AlN 3 , which in the 1990s was proposed to be either Ti 3 AlN 2 or Ti 3 Al 2 N 2 [83,84], but was finally determined to be Ti 4 AlN 3 [85,86,87]. This conclusion inspired Holm et al [88] [89], and it was logical to proceed with an attempt to synthesize Ti 4 SiC 3 .…”

Section: Predictions Of New Max Phasesmentioning

confidence: 99%

The M+1AX phases: Materials science and thin-film processing

et al. 2010

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This article is a critical review of the M n+1 AX n phases ("MAX phases", where n =1, 2, or 3) from a materials science perspective. MAX phases are a class of hexagonal-structure ternary carbides and nitrides ("X") of a transition metal ("M") and an A-group element. The most well known are Ti 2 AlC, Ti 3 SiC 2 , and Ti 4 AlN 3 . There are ~60 MAX phases with at least 9 discovered in the last five years alone. What makes the MAX phases fascinating and potentially useful is their remarkable combination of chemical, physical, electrical, and mechanical properties, which in many ways combine the characteristics of metals and ceramics. For example, MAX phases are typically resistant to oxidation and corrosion, elastically stiff, but at the same time they exhibit high thermal and electrical conductivities and are machinable. These properties stem from an inherently nanolaminated crystal structure, with M n+1 X n slabs intercalated with pure A-element layers. The research on MAX phases has been accelerated by the introduction of thin-film processing methods.Magnetron sputtering and arc deposition have been employed to synthesize single-crystal material by epitaxial growth, which enables studies of fundamental materials properties. However, the surface-initiated decomposition of M n+1 AX n thin films into MX compounds at temperatures of 1000-1100 °C is much lower than the decomposition temperatures typically reported for the corresponding bulk material. We also review the prospects for low-temperature synthesis, which is essential for deposition of MAX phases onto technologically important substrates. While deposition of MAX phases from the archetypical Ti-Si-C and Ti-Al-N systems typically require synthesis temperatures of ~800 °C, recent results have demonstrated that V 2 GeC and Cr 2 AlC can be deposited at ~450 °C. Also, thermal spray of Ti 2 AlC powder has been used to produce thick coatings. We further treat progress in the use of first-principles calculations for predicting hypothetical MAX phases and their properties. Together with advances in processing and materials 3 analysis, this progress has led to recent discoveries of numerous new MAX phases such as Ti 4 SiC 3 , Ta 4 AlC 3 , and Ti 3 SnC 2 . Finally, important future research directions are discussed. These include charting the unknown regions in phase diagrams to discover new equilibrium and metastable phases, as well as research challenges in understanding their physical properties, such as the effects of anisotropy, impurities, and vacancies on the electrical properties, and unexplored properties such as superconductivity, magnetism, and optics. 4

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“…However, at high ion energies, a steep price is extracted in the form of residual ion-induced compressive stress. 20,21 Early studies of these effects characterized differences in film growth kinetics as a function of the average ion energy per deposited atom 〈 〉. 22,23,24 It was soon realized, however, that 〈 〉, the product of the ion energy Ei and Ji/JMe (the ratio of the accelerated rare-gas ion flux Ji to the deposited metal atom flux JMe) is not a universal parameter for describing the effects of low-energy ion irradiation on film microstructure.…”

Section: Introductionmentioning

confidence: 99%

A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering

Greczyński

Jensen

et al. 2014

Surface and Coatings Technology

146

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We review results on the growth of metastable Ti1-xAlxN alloy films by hybrid high-power pulsed and dc magnetron co-sputtering (HIPIMS/DCMS) using the time domain to apply substrate bias either in synchronous with the entire HIPIMS pulse or just the metal-rich portion of the pulse in mixed Ar/N2 discharges. Depending upon which elemental target, Ti or Al, is powered by HIPIMS, distinctly different film-growth kinetic pathways are observed due to charge and mass differences in the metal-ion fluxes incident at the growth surface. Al + ion irradiation during Al-HIPIMS/Ti-DCMS at 500 C, with a negative substrate bias Vs = 60 V synchronized to the HIPIMS pulse (thus suppressing Ar + ion irradiation due to DCMS), leads to single-phase NaCl-structure Ti1-xAlxN films (x ≤ 0.60) with high hardness (> 30 GPa with x > 0.55) and low stress (0.2-0.8 GPa compressive). Ar + ion bombardment can be further suppressed in favor of predominantly Al + ion irradiation by synchronizing the substrate bias to only the metal-ion-rich portion of the Al-HIPIMS pulse. In distinct contrast, Ti-HIPIMS/Al-DCMS Ti1-xAlxN layers grown with Ti + /Ti 2+ metal ion irradiation and the same HIPIMS-synchronized Vs value, are two-phase mixtures, NaCl-structure Ti1-xAlxN plus wurtzite AlN, exhibiting low hardness (≃18 GPa) with high compressive stresses, up to -3.5 GPa. In both cases, film

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The ternary system titanium-aluminum-nitrogen

Cited by 193 publications

References 11 publications

Microstructural evolution during high-temperature oxidation of spark plasma sintered Ti2AlN ceramics

Microstructural evolution during high-temperature oxidation of spark plasma sintered Ti2AlN ceramics

The M+1AX phases: Materials science and thin-film processing

A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering

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