2004
DOI: 10.1016/j.diamond.2003.12.005
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The use of CVD diamond for high-power switching using electron beam exitation

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Cited by 12 publications
(8 citation statements)
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“…During the last decade, many progresses were achieved in diamond growth by micro-wave plasma assisted chemical vapour deposition (MPCVD) leading to the production of device-grade single crystal diamond [1][2][3][4]. However, to sustain the very high voltages involved in high power devices, the use of a transverse or volume configuration is often necessary, such as for example for photoswitches [5]. As a consequence, hundreds of microns of extremely high quality diamond crystals have to be synthesized.…”
Section: Introductionmentioning
confidence: 99%
“…During the last decade, many progresses were achieved in diamond growth by micro-wave plasma assisted chemical vapour deposition (MPCVD) leading to the production of device-grade single crystal diamond [1][2][3][4]. However, to sustain the very high voltages involved in high power devices, the use of a transverse or volume configuration is often necessary, such as for example for photoswitches [5]. As a consequence, hundreds of microns of extremely high quality diamond crystals have to be synthesized.…”
Section: Introductionmentioning
confidence: 99%
“…The progress that has been achieved over the past few years on the growth of thick and high-purity homoepitaxial single-crystal diamond by chemical vapour deposition (CVD) has open a range of possible applications in areas such as optics or power electronics [1][2][3][4]. The synthesis of single-crystal diamond layers by CVD exhibiting very high values of electron and hole mobilities and very long free-carrier recombination lifetimes has been recently reported [5].…”
Section: Introductionmentioning
confidence: 99%
“…These are made up of a MIM-type structure (metal-insulator-metal), i.e. an intrinsic diamond film a few hundred micrometres thick sandwiched between two ohmic contacts [7]. Besides the difficulty in achieving such contacts, this application also requires very high material quality and the films must also be several hundred micrometres thick.…”
Section: Introductionmentioning
confidence: 99%