The use of high resolution haze for control of SOI surface roughness in a volume production environment.

Brun, Roland; Moulin, C.; Bast, Gerhard; Simpson, Gavin; Dighe, Prasanna

doi:10.1109/soi.2010.5641056

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“…The dark field defect inspection method identifies and classifies defects by collecting scattered light caused by defects [3] . Due to the micro-roughness existing on the wafer surface, a small amount of scattered signal, called the haze signal, is formed [4] . Such signal is the prevalent underlying signal and is the main factor affecting the accuracy of the dark field defect inspection system [5] .…”

Section: Introductionmentioning

confidence: 99%

Elliptical polarization characterization of scattered light in dark field defect inspection technology

Wu,

Xu,

Liu

2023

3rd International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2023)

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In the field of unpatterned wafer inspection, the biggest market share is dark field defect inspection, in which the signalto-noise ratio limits the detection limit. In order to improve the signal-to-noise ratio of the optical detection method based on the theory of dark-field scattered light. In this paper, the influence of the polarization characteristic of light on the scattering field is studied, and the signal-to-noise ratio of the scattering signal can be improved by controlling the polarization component of light. The results show that modulating the polarized light can achieve a higher signal-to-noise ratio.

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Section: Introductionmentioning

confidence: 99%