“…Among the various semiconductor surfaces, the Si͑100͒ surface is by far the most important one due to its central role in microelectronics. Therefore many studies have been dedicated to aspects of benzene adsorption on Si͑100͒ which concentrate on theoretical 2,4-15 and experimental aspects, e.g., temperature-programmable desorption ͑TPD͒ spectroscopy and low-energy electron diffraction ͑LEED͒, 6,[16][17][18] scanning tunneling microscopy ͑STM͒, 8,11,12,[19][20][21][22][23][24] UV and x-ray photoelectron spectroscopies or near edge x-ray absorption fine structure spectroscopy ͑NAXAFS͒, 6,17,[25][26][27][28][29] vibrational spectroscopies 9,16,20,25,30 such as infrared absorption spectroscopy and high-resolution electron energy loss spectroscopy ͑HREELS͒, or other techniques. 31 In the pioneering experimental work of Taguchi et al, 16 it was found that benzene undergoes a nondissociative molecular chemisorption on the reactive ͑2 ϫ 1͒-reconstructed Si͑100͒ surface.…”