The Way To One-Half Micrometer Photolithography

Kameyama, Masaomi; Ushida, Kazuo

doi:10.1117/12.7974071

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1993

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“…There are practical methods of reducing the laser bandwidth to the required value without excessively degrading the laser power. Following the early development work of Pol and co-workers at AT&T (8)(9)(10)(11), several vendors of optical lithographic equipment have followed this path to produce the first prototype 248-nm optical lithographic equipment (12)(13)(14)(15)(16)(17)(18)(19).…”

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confidence: 99%

Optical Lithography at 248 nm

Hibbs¹

1991

J. Electrochem. Soc.

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The krypton fluoride excimer laser has provided a means of exploiting the deep-ultraviolet for optical lithography. The use of this new light source requires the development of new photoresists and opens up a new set of concerns for the lithographer. Durability of lenses, coatings, and photomask materials are potential problems because of the very high peak power emitted by the pulsed laser. Optical interference effects, caused by the coherence of the laser light, could also cause trouble. Finally, the laser itself has high requirements for reliability and safety.

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