“…However, this mechanism is impossible to be the main mechanism for the surface defect creation on anatase in this work. This is because (i) the removal of a lattice oxygen atom can occur when crystalline TiO 2 is treated at high temperature in the presence of reduced gas (H 2 , CO, or vacuum) but the surface defect creation in this work was done at mild temperature in the presence of oxidized gas (air) and (ii) based on the predominant surface, a lattice oxygen atom on (1 0 1) anatase (which is largely predominant surface in the equilibrium crystal of anatase [21,22,[43][44][45]) is more difficult to remove than that of (1 1 0) rutile (which is the predominant surface of rutile [46,47]), so that the removal of lattice oxygen atom on anatase should occur at higher temperature (with the presence of reduced gas) than that of rultile phase. Therefore, we infer that the surface defect creation in the first step is not attributed to the removal of lattice oxygen atom.…”