1991
DOI: 10.1002/andp.19915030406
|View full text |Cite
|
Sign up to set email alerts
|

Theoretical Analysis of the Einstein Relation in n‐Channel Inversion Layers on A3IIB2V Semiconductors under Magnetic Quantization

Abstract: A b s t r a c t . We have invcstigated the Einstein rrletion in n-channel inversion lityeison A,i'U,V semiconductors tit low temperatures on the basis of D newly derived dispersion reltrtion of the ciirrieis undcr orbitiary magnetic quantization for the general case which occurs from the consideration o f the auiimtropies of the b m d parameters within the frame work of k ' p formalism. I t is found by inco1por;tting both the vffects of electron spin and broibdening of L;tnclau Irvels, using n-Cd,As, :is itti … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2010
2010
2022
2022

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 7 publications
(1 citation statement)
references
References 24 publications
0
1
0
Order By: Relevance
“…In this context, it may be noted that with the advent of fine line lithography [39], molecular beam epitaxy [40,41], organometallic vapor-phase epitaxy [42], and other experimental techniques, low-dimensional structures [43][44][45][46][47][48][49][50][51][52][53][54][55] having quantum confinement of the charge carriers in one, two, and three dimensions [such as ultrathin films (UFs), nipi structures, inversion and accumulation layers, quantum well superlattices, carbon nanotubes, quantum wires (QWs), quantum wire superlattices, quantum dots (QDs), magnetoinversion and accumulation layers, quantum dot superlattices, etc.] 1.2.1 to 1.2.18, respectively.…”
mentioning
confidence: 99%
“…In this context, it may be noted that with the advent of fine line lithography [39], molecular beam epitaxy [40,41], organometallic vapor-phase epitaxy [42], and other experimental techniques, low-dimensional structures [43][44][45][46][47][48][49][50][51][52][53][54][55] having quantum confinement of the charge carriers in one, two, and three dimensions [such as ultrathin films (UFs), nipi structures, inversion and accumulation layers, quantum well superlattices, carbon nanotubes, quantum wires (QWs), quantum wire superlattices, quantum dots (QDs), magnetoinversion and accumulation layers, quantum dot superlattices, etc.] 1.2.1 to 1.2.18, respectively.…”
mentioning
confidence: 99%