“…In this context, it may be noted that with the advent of fine line lithography [39], molecular beam epitaxy [40,41], organometallic vapor-phase epitaxy [42], and other experimental techniques, low-dimensional structures [43][44][45][46][47][48][49][50][51][52][53][54][55] having quantum confinement of the charge carriers in one, two, and three dimensions [such as ultrathin films (UFs), nipi structures, inversion and accumulation layers, quantum well superlattices, carbon nanotubes, quantum wires (QWs), quantum wire superlattices, quantum dots (QDs), magnetoinversion and accumulation layers, quantum dot superlattices, etc.] 1.2.1 to 1.2.18, respectively.…”