In an ion implanter, plasma flood gun (PFG) is used to
provide electrons to neutralize the accumulated charge on the wafer
surface to avoid breakdown damage. With the development of ion
implantation technology, four key requirements have been put forward
for PFG. They are simple structure, plasma with high density and low
electron temperature, no metal contamination and long life. The
existing PFG, such as the filament type PFG, can hardly meet the
above requirements at the same time. 2.45 GHz ECR ion source with
the advantages of high beam density, high stability, long life time
and no filament metal contamination, has shown great potential to
work as PFG. Recently, a miniaturized 2.45 GHz permanent magnet
electron cyclotron resonance PFG (PMECR-PFG) has been developed at
Peking University (PKU). In our previous test, 8.8 mA electron
extraction current was obtained with argon gas. In this work, by
optimizing the magnetic field configuration to a resonant
configuration, the performance of this ECR-PFG was greatly
improved. With 100 W microwave power, an 80 mA electron current
load was obtained under the extraction voltage of 0.1 kV. To
minimize the metal contamination, a three-slit graphite plasma
electrode was fabricated and a 50 mA load was generated at only
30 W RF power. During all tests, the gas consumption rate is lower
than 0.6 sccm, which is beneficial to maintain the vacuum of
implanter beamline.