Theoretical basis and performance research on advanced non-contacting ion beam manufacturing process for optical materials

Abstract

Ultra-smooth surface is very important for the performance of high energy optical system in the defence field. Low quality optical elements will cause energy loss and affect the performance of the optical system. Ultra-precision manufacturing technology of optical components is the key technology to obtain high quality optical components. As an advanced ultra-precision and no-contact surface processing technology, Ion Beam Manufacturing (IBM) was studied. Based on the analysis of the relationship between the ion beam current density distribution parameters obtained by faraday scan and the removal function, more effective removal function calculation method was found, the removal function model for IBF fused silica was established. The Molecular Dynamics(MD)simulation to study interaction between incident ion and optical substrate. Ion particle motion behaviour were obtained under different incident energies. The effect of incidence angle on surface roughness were carried out, lower surface roughness by smaller angle incident, ultra-precision surface of optical components were obtained by IBF experiments.

Design of filament-type auxiliary ion source and study on its improvement of thin film parameters

“…Due to its low working temperature, high film forming efficiency, good film quality and many other advantages, it can prepare large-area, highpurity, good uniformity, good compactness, and strong bonding force with the substrate, making it the most widely used coating technology in China [3] . It is widely used in key devices such as silicon chips, infrared lidar windows, filters, optical lenses and sensors, as well as cutting-edge technology fields such as industrial production, consumer electronics manufacturing, national defense and military [4,5] . Therefore, magnetron sputtering technology is a current research hotspot [6] .…”