Nanomesh InGaN/GaN multi‐quantum‐well (MQWs) were grown on nanopore arrays of GaN by metal organic vapour phase epitaxy (MOCVD). The hexagonal nanopore arrays in GaN with average diameter ∼200 nm and wall thickness ∼100 nm was fabricated by inductively couple plasma (ICP) etching using anodic alumina (AAO) template as a mask. Nanoepitaxial GaN is found to deposit on the top surface of nanoporous GaN to form a nanomesh structure, with inverted pyramid at the initial stage and followed by the nano‐pyramid structure. The existence of the inverted pyramid demonstrates the 3D strain relaxation in the GaN layer, which is confirmed by the peak shift in photoluminescence, and diffraction patterns. Better light emission is demonstrated on nanomesh InGaN MQWs, attributed to the improvement of the internal quantum efficiency by the reduction of threading dislocations and the improvement of light extraction efficiency by random scattering at the nanopores in GaN. In addition, more indium incorporation has been demonstrated compared to the control InGaN MQWs, benefiting from the strain relaxation in nanoepitaxial GaN. The nanomesh InGaN/GaN MQWs are beneficial for high efficiency LEDs and future design of emission spectrum of nitride semiconductors for solar cells applications. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)