Theoretical study of extreme ultraviolet pellicles with nanometer thicknesses

Kim, Sang-Kon

doi:10.1016/j.sse.2024.108924

Solid-State Electronics

2024

DOI: 10.1016/j.sse.2024.108924

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Theoretical study of extreme ultraviolet pellicles with nanometer thicknesses

Sang-Kon Kim

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Cited by 1 publication

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Contact Hole Shrinkage: Simulation Study of Resist Flow Process and Its Application to Block Copolymers

Kim

2024

Micromachines

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For vertical interconnect access (VIA) in three-dimensional (3D) structure chips, including those with high bandwidth memory (HBM), shrinking contact holes (C/Hs) using the resist flow process (RFP) represents the most promising technology for low-k1 (where CD=k1λ/NA,CD is the critical dimension, λ is wavelength, and NA is the numerical aperture). This method offers a way to reduce dimensions without additional complex process steps and is independent of optical technologies. However, most empirical models are heuristic methods and use linear regression to predict the critical dimension of the reflowed structure but do not account for intermediate shapes. In this research, the resist flow process (RFP) was modeled using the evolution method, the finite-element method, machine learning, and deep learning under various reflow conditions to imitate experimental results. Deep learning and machine learning have proven to be useful for physical optimization problems without analytical solutions, particularly for regression and classification tasks. In this application, the self-assembly of cylinder-forming block copolymers (BCPs), confined in prepatterns of the resist reflow process (RFP) to produce small contact hole (C/H) dimensions, was described using the self-consistent field theory (SCFT). This research paves the way for the shrink modeling of the enhanced resist reflow process (RFP) for random contact holes (C/Hs) and the production of smaller contact holes.

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Contact Hole Shrinkage: Simulation Study of Resist Flow Process and Its Application to Block Copolymers

Kim

2024

Micromachines

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Theoretical study of extreme ultraviolet pellicles with nanometer thicknesses

Cited by 1 publication

References 22 publications

Contact Hole Shrinkage: Simulation Study of Resist Flow Process and Its Application to Block Copolymers

Contact Hole Shrinkage: Simulation Study of Resist Flow Process and Its Application to Block Copolymers

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