Thermal activation of diamond growth in carbon-hydrogen-halogen systems

Patterson, Donald E.; Chu, Chiheng; Bai, Benjamin J.; Xiao, Zuo; Komplin, Norma J.; Hauge, Robert H.; Margrave, John L.

doi:10.1016/0925-9635(92)90098-9

Cited by 26 publications

(9 citation statements)

References 2 publications

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“…It has been suggested by several authors that growth of diamond at lower temperatures may be obtained by including halogen or halogenated methane into the growth vapor during chemical vapor deposition of diamond. ,− For instance, Patterson et al have used a thermally activated halogen-assisted CVD technique at low temperatures (525−1023 K) …”

Section: Resultsmentioning

confidence: 99%

“…Several researchers have suggested that diamond can also be grown from gas mixtures of halogens or halogenated methane. − When halogen-containing species are added to the vapor, a lower substrate temperature can be used. ,, For instance, the presence of fluorine lowers the critical substrate temperature by several hundred degrees compared to hydrogen-based processes . Reduction of the substrate temperature is strongly desired for growth of diamond on materials which cannot tolerate high temperatures.…”

Section: Introductionmentioning

confidence: 99%

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Stability of Halogen-Terminated Diamond (111) Surfaces

Larsson

Lunell²

1997

J. Phys. Chem. A

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The adsorption of the different species X and CX 3 on an X-terminated diamond (111) surface (X ) H, F, Cl, Br) has been investigated structurally and energetically, using a cluster approach and two different types of quantum mechanical methods: the ab initio molecular orbital (MO) method and the first-principle density functional theory (DFT) method, respectively. The halogen species F and Cl, as well as hydrogen H, were all shown to be able to sustain the sp 3 structural configuration of the surface carbon atoms. Furthermore, the adsorption energies were much larger for the H and F species than for other species like Cl and Br, indicating that H and F species stabilize the diamond (111) surface better than the Cl and Br species do. For Br large sterical hindrances are induced, and the diamond (111) surface cannot be stabilized. The adsorption of CH 3 or CF 3 to a radical carbon on a H-or F-terminated diamond (111) surface stabilizes also the sp 3 structural configuration of the radical carbon atom. The large difference in adsorption energy of the species CH 3 and CF 3 indicates that the probability for diamond growth, based on the CF 3 species as a dominant growth species on a F-terminated diamond (111) surface, is much lower than for growth based on the CH 3 species as a dominant growth species on a H-terminated surface. There is no tendency for the gaseous species CCl 3 and CBr 3 to adsorb on a Cl-or Br-terminated diamond (111) surface.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Stability of Halogen-Terminated Diamond (111) Surfaces

Larsson

Lunell²

1997

J. Phys. Chem. A

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“…The addition of halogenated gases to the standard hydrogen and methane vapour phase allows the deposition of diamond films at considerably lower temperatures (250-750 ºC) [55][56][57].…”

Section: Figmentioning

confidence: 99%

Diamond growth by chemical vapour deposition

Grácio¹,

Fan²,

Madaleno³

2010

J. Phys. D: Appl. Phys.

256

156

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This paper reviews the growth of diamond by chemical vapour deposition (CVD). It includes the following seven parts: (1) Properties of diamond: this part briefly introduces the unique properties of diamond and their origin and lists some of the most common diamond applications. (2) Growth of diamond by CVD: this part reviews the history and the methods of growing CVD diamond. (3) Mechanisms of CVD diamond growth: this part discusses the current understanding on the growth of metastable diamond from the vapour phase. (4) Characterization of CVD diamond: we discuss the two most common techniques, Raman and XRD, which have been intensively employed for characterizing CVD diamond. (5) CVD diamond growth characteristics: this part demonstrates the characteristics of diamond nucleation and growth on various types of substrate materials. (6) Nanocrystalline diamond: in this section, we present an introduction to the growth mechanisms of nanocrystalline diamond and discuss their Raman features. This paper provides necessary information for those who are starting to work in the field of CVD diamond, as well as for those who need a relatively complete picture of the growth of CVD diamond.

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“…As far as the other allotrope of carbon is concerned, Margrave's group has been studying the fluorination of diamond for a number of years (72)(73)(74)(75). More recently, Margrave and co-workers have been looking at the halogen-assisted CVD of diamond (76)(77)(78)(79), including the potential disposal of CFCs and Halons via this technique (80). It will be interesting to examine the economics of this latter proposal when done on a large scale.…”

Section: Fluorinated Allotropes Of Carbonmentioning

confidence: 99%

Inorganic Fluorine Chemistry

Thrasher

Strauss

1994

ACS Symposium Series

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Fluorine and fluorinated substituent groups play an increasingly important role in modern inorganic chemistry. Many advances in solid-sate chemistry, coordination chemistry, main group element chemistry, and organometallic chemistry rely on the unique physical and chemical properties of the most electronegative of the chemical elements. This chapter lists the important monographs and reviews that have been published during the last twenty-five years in this area as well as some thoughts about where the field of inorganic fluorine chemistry is heading.The unusual properties exhibited by numerous materials upon the incorporation of either fluorine or fluorine-containing substituents are no longer just topics of idle curiosity for the academician, but are the driving force behind developments in the field of fluorine chemistry. Many advances have either recently found or await commercialization as witnessed by the increasing diversity of industrial applications of fluorine compounds (7-7). Two illustrative examples of the current importance of inorganic fluorine chemistry to industry are the development of both chlorofluorocarbon (CFC) alternatives and new precursors for chemical vapor deposition (CVD) of inorganic materials. Although the CFC alternatives will almost certainly be organofluorine compounds, the processes being developed to produce these materials cannot escape the use of inorganic fluorine chemistry in terms of catalysts (8-15), halogen exchange reagents (16-20), and the like. The references given here serve only as representative examples; the current patent literature is full of references in light of the global concern to help halt the depletion of stratospheric ozone. The second aforementioned case falls into the increasingly important area of materials science. For example, a number of groups have recently taken advantage of the well-known increase in volatility associated with fluorine incorporation to make a series of volatile metal alkoxides which serve as new precursors for CVD of metal fluorides (21-28). Separate chapters on both of these topics of industrial importance appear later in this book.

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Thermal activation of diamond growth in carbon-hydrogen-halogen systems

Cited by 26 publications

References 2 publications

Stability of Halogen-Terminated Diamond (111) Surfaces

Stability of Halogen-Terminated Diamond (111) Surfaces

Diamond growth by chemical vapour deposition

Inorganic Fluorine Chemistry

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