Thermal and catalytic decomposition of Si2H6 on a Ge(100)2 × 1 surface: Photoemission and LEED studies

Steinmetz, D.; Van, S.; Ringeisen, F.; Bolmont, D.; Koulmann, J.J.

doi:10.1016/0039-6028(94)90403-0

Surface Science

1994

DOI: 10.1016/0039-6028(94)90403-0

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Thermal and catalytic decomposition of Si2H6 on a Ge(100)2 × 1 surface: Photoemission and LEED studies

D. Steinmetz¹,

S. Van²,

F. Ringeisen³

et al.

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Cited by 2 publications

References 13 publications

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Thermal and catalytic decomposition of Si2H6 on a Ge(100)2 × 1 surface: Photoemission and LEED studies

Cited by 2 publications

References 13 publications

Growth of a Ge/Si/Ge (100) heterostructure by very low pressure chemical vapour deposition using Si2H6 and GeH4 gases—photoemission and low energy electron diffraction studies

Growth of a Ge/Si/Ge (100) heterostructure by very low pressure chemical vapour deposition using Si2H6 and GeH4 gases—photoemission and low energy electron diffraction studies

Growth of epitaxial SiGe nanostructures at low temperature on Si(100) using hot-wire assisted gas source molecular beam epitaxy

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