THERMAL CHARACTERIZATION OF GaAsN THIN FILMS BY PULSED PHOTOTHERMAL REFLECTANCE TECHNIQUE

Abstract

Thermal conductivity of Gallium Arsenic Nitride ( GaAsN ) epilayer on Gallium Arsenide ( GaAs ) substrate prepared by Molecular Beam Epitaxy technique was measured using pulsed photothermal reflectance technique. Within the thickness ranging from 20 nm to 80 nm, no thickness dependent relationship with thermal conductivity of GaAsN epilayer was found, and the average thermal conductivity is about 28 W/mK at room temperature.

Sb2Te3 Nanoparticles with Enhanced Seebeck Coefficient and Low Thermal Conductivity

“…The measurement of κ for nanostructures or even thin films is very difficult , due to the small feature size. Here, we carried out the pulsed photothermal reflectance (PPR) , process to evaluate the thermal conductivity of the samples. Here, we noted that the PPR measurements can only test the thermal conductivity along the normal of the particle film surface while the previous discussion on the Seebeck and electrical conductivity is along the surface of the samples.…”

“…The thermal conductivity of a 20 nm nanoparticle thin film was measured by pulsed photothermal reflectance (PPR). [24][25][26] For the PPR technique, the measurement on film samples is carried out in the perpendicular direction to the surface as previously reported. 24 Before the measurement, the thin film sample, deposited on high-resistivity silicon substrate, is coated with a gold film layer of 1 μm thickness.…”

“…The thermal conductivity of a 20 nm nanoparticle thin film was measured by pulsed photothermal reflectance (PPR). − …”

Controlled growth of antimony based nanostructured materials by chemical vapor deposition

“…The average thicknesses of samples were obtained from five different points of the samples. The thermal conductivity of 20-nm nanoparticle thin film was measured by pulsed photothermal reflectance (PPR) [83][84][85].For the PPR technique, the measurement on thin film samples was carried out in the perpendicular direction to the surface as previous reported [83]. Before the measurement, the thin film sample deposited on the high-resistivity silicon substrate was coated with a gold film layer of…”

“…The measurement of κ for nanostructures or even thin films is very difficult [56,126] because of the small feature size. The pulsed photothermal reflectance (PPR) [83,84] process is carried out to evaluate the thermal conductivity of the samples. It is noted that the PPR measurements can only test the thermal conductivity along the vertical plane of the particle film while the previous discussion on Seebeck coefficient and electrical conductivity is along the surface of the samples.…”