2011
DOI: 10.1039/c0jm04563b
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Thermal conduction effects impacting morphology during synthesis of columnar nanostructured TiO2 thin films

Abstract: Title: Thermal conduction eff ects impacting morphology during synthesis of columnar nanostructured TiO 2 thin fi lms.Thermal conduction during thin fi lm synthesis by aerosolchemical vapor deposition (ACVD) process plays an important role in evolution of unique nanostructured one-dimensional TiO 2 columnar nanostructures, which govern overall light energy conversion effi ciency.The aerosol chemical vapor deposition (ACVD) process allows for the synthesis of nanostructured films with well tuned morphologies th… Show more

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Cited by 18 publications
(16 citation statements)
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“…Nanostructured anatase solid coatings have been previously reported by only a few authors [32,33]. Column-like morphologies of TiO2 are commonly reported for rutile TiO2 [34] and similar structures have been reported for anatase nanocrystals [35]. Microscale plated-anatase crystals were reported from aerosol CVD [36].…”
Section: Discussionmentioning
confidence: 73%
“…Nanostructured anatase solid coatings have been previously reported by only a few authors [32,33]. Column-like morphologies of TiO2 are commonly reported for rutile TiO2 [34] and similar structures have been reported for anatase nanocrystals [35]. Microscale plated-anatase crystals were reported from aerosol CVD [36].…”
Section: Discussionmentioning
confidence: 73%
“…The branching of columnar nanostructures has previously been studied by our group in detail and has been attributed to the decrease in the tip surface temperature of the TiO 2 nanostructure due to thermal conduction effects as the column height increases. 22,23 This decrease in surface temperature results in a decrease in the sintering rates, thus leading to the formation of a branched structure. The branching of the nanostructures becomes observable by SEM for taller columns with height greater than 5 μm.…”
Section: Resultsmentioning
confidence: 99%
“…As illustrated in Fig. 9, thin film growth mechanisms in ACVD could be qualitatively explained in terms of τ sin and particle arrival time, t arv [85]. Within a boundary layer, deposited particles form structures with orientation [86,87].…”
Section: Aerosol Routes For Morphology Controlmentioning
confidence: 99%