2006
DOI: 10.1016/j.surfcoat.2005.11.113
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Thermal decomposition of Zr1−xAlxN thin films deposited by magnetron sputtering

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Cited by 40 publications
(26 citation statements)
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“…6. The absolute values of these parameters are close to those previously reported for other multicomponent films [9,16,35]. For both deposition temperatures (270 and 600°C) the hardness firstly increases and then it falls down with x rise.…”
Section: Methodssupporting
confidence: 89%
“…6. The absolute values of these parameters are close to those previously reported for other multicomponent films [9,16,35]. For both deposition temperatures (270 and 600°C) the hardness firstly increases and then it falls down with x rise.…”
Section: Methodssupporting
confidence: 89%
“…At even higher temperatures this alloy further decomposes into its thermodynamically stable phases c-TiN and wurtzite (w-) AlN [9] that deteriorates the mechanical properties [10,11]. The related Zr 1-x Al x N alloys display characteristics similar to Ti 1-x Al x N with a miscibility gap for cubic solid solutions and a higher driving force for decomposition compared to Ti 1-x Al x N [12,13] resulting in promising mechanical properties [14][15][16][17][18] at high temperature. In addition to cubic solid solutions, wurtzite structured Zr 1-x Al x N solid solutions have high thermal stability when the Al content is higher than ~70% [13].…”
Section: Introductionmentioning
confidence: 99%
“…Zirconium based ternary transition metal nitrides composite films have been reported as promising coatings mainly in the field of protection technologies against wear and hot corrosion at high temperatures, superior resistance to abrasive and chemical wear [1][2][3]. Incorporation of Al atoms to ceramic nitride films provides higher hardness, oxidation and wear resistance.…”
Section: Introductionmentioning
confidence: 99%
“…ZrAlN composite films have been deposited by employing various methods such as dc reactive magnetron sputtering [6], reactive magnetron sputtering [2], magnetron sputtering [7] and cathodic arc [8]. Room temperature deposition of such nanocrystalline multiphase composite films is highly attractive since high deposition temperatures severely limit the selection of substrate materials.…”
Section: Introductionmentioning
confidence: 99%