Thin
films of quinacridone deposited by physical vapor deposition
on silicon dioxide were investigated by thermal desorption spectroscopy
(TDS), mass spectrometry (MS), atomic force microscopy (AFM), specular
and grazing incidence X-ray diffraction (XRD, GIXD), and Raman spectroscopy.
Using a stainless steel Knudsen cell did not allow the preparation
of a pure quinacridone film. TDS and MS unambiguously showed that
in addition to quinacridone, desorbing at about 500 K (γ-peak),
significant amounts of indigo desorbed at about 420 K (β-peak).
The existence of these two species on the surface was verified by
XRD, GIXD, and Raman spectroscopy. The latter spectroscopies revealed
that additional species are contained in the films, not detected by
TDS. In the film mainly composed of indigo a species was identified
which we tentatively attribute to carbazole. The film consisting of
mainly quinacridone contained in addition p-sexiphenyl. The reason
for the various decomposition species effusing from the metal Knudsen
cell is the comparably high sublimation temperature of the hydrogen
bonded quinacridone. With special experimental methods and by using
glass Knudsen-type cells we were able to prepare films which exclusively
consist of molecules either corresponding to the β-peak or the
γ-peak. These findings are of relevance for choosing the proper
deposition techniques in the preparation of quinacridone films in
the context of organic electronic devices.