High thermal conductivity materials
show promise for thermal mitigation
and heat removal in devices. However, shrinking the length scales
of these materials often leads to significant reductions in thermal
conductivities, thus invalidating their applicability to functional
devices. In this work, we report on high in-plane thermal conductivities
of 3.05, 3.75, and 6 μm thick aluminum nitride (AlN) films measured via steady-state thermoreflectance. At room temperature,
the AlN films possess an in-plane thermal conductivity of ∼260
± 40 W m–1 K–1, one of the
highest reported to date for any thin film material of equivalent
thickness. At low temperatures, the in-plane thermal conductivities
of the AlN films surpass even those of diamond thin films. Phonon–phonon
scattering drives the in-plane thermal transport of these AlN thin
films, leading to an increase in thermal conductivity as temperature
decreases. This is opposite of what is observed in traditional high
thermal conductivity thin films, where boundaries and defects that
arise from film growth cause a thermal conductivity reduction with
decreasing temperature. This study provides insight into the interplay
among boundary, defect, and phonon–phonon scattering that drives
the high in-plane thermal conductivity of the AlN thin films and demonstrates
that these AlN films are promising materials for heat spreaders in
electronic devices.