Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material

Abstract

Micro- and nanopatterns perform unique functions and have attracted attention in various industrial fields, such as electronic devices, microfluidics, biotechnology, optics, sensors, and smart and anti-adhesion surfaces. To put fine-patterned products to practical use, low-cost patterning technology is necessary. Nanoimprint lithography (NIL) is a promising technique for high-throughput nanopattern fabrication. In particular, thermal nanoimprint lithography (T-NIL) has the advantage of employing flexible materials and eliminating chemicals and solvents. Moreover, T-NIL is particularly suitable for compostable and recyclable materials, especially when applying biobased materials for use in optics and electronics. These attributes make T-NIL an eco-friendly process. However, the processing time of normal T-NIL is longer than that of ultraviolet (UV) NIL using a UV-curable resin because the T-NIL process requires heating and cooling time. Therefore, many studies focus on improving the throughput of T-NIL. Specifically, a T-NIL process based on a roll-to-roll web system shows promise for next-generation nanopatterning techniques because it enables large-area applications with the capability to process webs several meters in width. In this review, the T-NIL process, roll mold fabrication techniques, and various materials are introduced. Moreover, metal pattern transfer techniques using a combination of nanotransfer printing, T-NIL, and a reverse offset are introduced.

Nanoimprint Lithography for Next-Generation Carbon Nanotube-Based Devices

“…Nano-scale carbon pillars with controlled diameters, down to 25 nm, and protruded lengths of 100 nm were successfully used as a master-mold for UV-NIL [ 32 ]. Nanoimprint lithography (NIL) [ 33 , 34 , 35 , 36 , 37 ] is a versatile nanofabrication technique that can pattern nanoscale features with high fidelity resolution on a variety of substrates in combination with thin-film deposition processes [ 38 , 39 , 40 , 41 , 42 ]. Thus, it is a viable processing method to incorporate catalyst for the growth of CNTs with a high aspect ratio.…”

Formation of Multiscale Pattern Structures by Combined Patterning of Nanotransfer Printing and Laser Micromachining

“…As a typical large-area patterning method, roll-to-roll (R2R) nanoimprint lithography (NIL) can effectively create nano/microscale pattern structures due to its excellent throughput and process simplicity [ 22 ]. The advanced NIL methods have been consistently developed and reported in terms of large-area patterning with industrial device manufacturing [ 23 , 24 ].…”

Water-Soluble Biomass Resist Materials Based on Polyglucuronic Acid for Eco-Friendly Photolithography

“…Nanotechnology, operating at an atomic and molecular scale, represents the fourth industrial revolution, profoundly influencing contemporary society [1]. In the realm of nanotechnology, microfabrication plays a pivotal role not only in manufacturing integrated circuits for the semiconductor industry but also in various domains, such as electronics, micro electromechanical systems (MEMS) devices, microfluidics, cell culture, and regenerative medicine in tissue engineering [2][3][4]. Focusing on applications in the biological domain, micro-and nanofabrication techniques hold immense potential for tailoring biomaterials with desired characteristics [5,6].…”