Thin films of boron nitride (BN), particularly the sp 2-hybridized polytypes hexagonal BN (h-BN) and rhombohedral BN (r-BN) are interesting for several electronic applications given band gaps in the UV. They are typically deposited close to thermal equilibrium by chemical vapor deposition (CVD) at temperatures and pressures in the regions 1400-1800 K and 1000-10000 Pa, respectively. In this letter, we use van der Waals corrected density functional theory and thermodynamic stability calculations to determine the stability of r-BN and compare it to that of h-BN as well as to cubic BN and wurtzitic BN. We find that r-BN is the stable sp 2-hybridized phase at CVD conditions, while h-BN is metastable. Thus, our calculations suggest that thin films of h-BN must be deposited far from thermal equilibrium. 2 I. INTRODUCTION Cubic BN (c-BN) with sp 3-hybridization and diamond structure is the most wellknown among BN phases. In 1957, Wentorf synthesized c-BN from a mixture of boron and nitrogen at high temperature and pressures. 1 The discovery of "Borazon" catalyzed work on the other polytypes of BN, foremost sp 2-hybridized hexagonal BN (h-BN) "white graphite" and to some extent the less studied wurtzite form (w-BN) that is similar to "hexagonal diamond". In addition to h-BN a rhombohedral sp 2-hybridized BN phase (r-BN) was reported 1958 by Hérold. 2 The two sp 2-hybridized BN polytypes differ in their stacking sequence of the basal planes along the c-axis; h-BN exhibits an ABAB... stacking while r-BN has an ABCABC... stacking sequence. 3 Furthermore, the basal planes in h-BN are rotated 180°, with respect to the previous basal plane, around the caxis ([0001]), while in r-BN, each next basal plane is instead shifted along the direction by 1.45 Å. The very close structural similarity between h-BN and r-BN is demonstrated in identical in-plane lattice parameters, 2.504 Å, and spacing between the basal planes, 3.333 Å. 4 As a thin film, BN is a promising material for many electronic applications, 5-8 where the polytype, h-BN or r-BN, are likely to affect the electronic properties: h-BN is reported to have a slightly larger band gap than r-BN; 5.955 9 and 5.7 10 eV, respectively. Typically, sp 2-BN films have been deposited by thermally activated Chemical Vapor Deposition (CVD), i.e. close to thermal equilibrium conditions. Epitaxial growth of sp 2-BN thin films by CVD is typically carried out from triethylboron, B(C2H5)3 (TEB), and ammonia, NH3 at low pressures of 1000-10000 Pa and temperatures in the range of 1100-1500 °C (1400-1800 K). 11 The high temperatures needed limit the number of available substrate materials, thus, growth of epitaxial films has been restricted to α-Al2O3 (0001) and 4H/6H-SiC (0001) substrates, yielding films oriented around the caxis. 12-15 sp 2-BN as a two-dimensional material will consist of a single basal plane with hexagonal symmetry and it is therefore, correctly, refer to as h-BN. However, the authors have previously pointed out the difficulty in structural determination of sp 2-BN films gro...