“…These approaches are, however, impractical for thermal simulation of devices in large-scale ICs. Several analytical transient thermal models previously presented [15,16,[47][48][49] are limited to simple geometries, such as homogeneous or semi-infinite structure, and are unable to be implemented to SOI MOSFETs because of the layer structure and interfaces in SOI devices. Recent studies of thermal modeling of SOI devices are usually based on the 1D thermal circuit with a single time constant [18,37] or heat flow models with constant channel temperature or uniform power generation in the channel [23,44], which ignore small-time-scale thermal behavior caused by the combined effects of small junction thermal capacitance and finite channel thermal resistance.…”