“…7,13,55,56 A unified understanding of interfacial thermal transport across metal-nonmetal interfaces does not exist possibly due to the lack of systematic benchmark studies of well-controlled interface growth, simultaneous structural and thermal characterizations, and corresponding comparison with thermal modellings because very few computational methods can take interface non-idealities into consideration. 44,57,58 In this work, we fill the gap by epitaxially growing (111) Al on (0001) ultraclean sapphire substrates by Molecular Beam Epitaxy (MBE). The Al-sapphire system is particularly suitable for benchmarking because of the atomically smooth surfaces, easy cleaning by baking at high temperatures in ultrahigh vacuum (UHV) conditions, no surface oxidation during baking, and no reaction with Al during growth.…”