2015
DOI: 10.1016/j.nimb.2014.10.030
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Thermal spike model interpretation of sputtering yield data for Bi thin films irradiated by MeV 84Kr15+ ions

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Cited by 6 publications
(11 citation statements)
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“…In the present case of Bi thin films irradiated by 26‐MeV Cu 7+ ions, the observed sputtering yield trend versus ion fluence is also similar to that we have prev2iously reported for the same target material but irradiated either by 27.5‐MeV Kr 15+ ions 11 or by 60 and 120‐keV Ar + ions . Such a close dependence of the sputtering yield on ion fluence was ascribed to the Bi target material nature (ie, thin film) and to the changes induced by ion irradiation in its surface topography and crystalline structure at a microscopic level . For keV Ar + incident ions, an important sputtering yield depression at very‐low ϕ‐values followed by a steady‐state regime above 2 × 10 14 cm −2 was observed in quantitative agreement with those shown in Figure of the present study.…”
Section: Analysis Of Results Comparison With Theory and Discussionsupporting
confidence: 89%
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“…In the present case of Bi thin films irradiated by 26‐MeV Cu 7+ ions, the observed sputtering yield trend versus ion fluence is also similar to that we have prev2iously reported for the same target material but irradiated either by 27.5‐MeV Kr 15+ ions 11 or by 60 and 120‐keV Ar + ions . Such a close dependence of the sputtering yield on ion fluence was ascribed to the Bi target material nature (ie, thin film) and to the changes induced by ion irradiation in its surface topography and crystalline structure at a microscopic level . For keV Ar + incident ions, an important sputtering yield depression at very‐low ϕ‐values followed by a steady‐state regime above 2 × 10 14 cm −2 was observed in quantitative agreement with those shown in Figure of the present study.…”
Section: Analysis Of Results Comparison With Theory and Discussionsupporting
confidence: 89%
“…For keV Ar + incident ions, an important sputtering yield depression at very‐low ϕ‐values followed by a steady‐state regime above 2 × 10 14 cm −2 was observed in quantitative agreement with those shown in Figure of the present study. Then, by using 2 other analysis techniques of atomic force microscopy and X‐rays diffraction, drastic surface topography and microstructure changes were observed when increasing both the Ar + ion energy and fluence with the formation of increasingly sized grains and granular structures of preferred (001) crystalline orientations . These correlated behaviors were explained due to the initial rapid erosion of a bulk‐character Bi material under the impact of primary Ar + ions before the sputtering yield saturation regime is reached, for which a much smaller energy density is deposited than initially at very thin thickness of the Bi film.…”
Section: Analysis Of Results Comparison With Theory and Discussionmentioning
confidence: 99%
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“…The coulomb explosion and thermal spikes models describe the proton irradiation induced changes inside the Zr matrix. The Coulomb explosion model is valid in the initial stages of the radiation damage where the radiation damage is dominated by the production of vacancies and interstitial related defects inside the Zr [26], whereas the thermal spikes model explains the production of thermal stresses as a result of heat generation due inelastic collisions of protons with the Zr matrix [27][28][29]. During inelastic collisions, latent tracks of the excited electrons are generated which heat up the Zr lattice through electron-phonon coupling which causes a rise in the temperature of the Zr lattice [30,31].…”
Section: Tensile Testsmentioning
confidence: 99%