The critical current density J c0 required for switching the magnetization of the free layer (FL) in a spintransfer torque magnetic random access memory (STT-MRAM) cell is proportional to the product of the damping parameter, saturation magnetization and thickness of the free layer, αM S t F . Conventional FLs have the structure CoFeB/nonmagnetic spacer/CoFeB. By reducing the spacer thickness, W in our case, and also splitting the single W layer into two layers of sub-monolayer thickness, we have reduced t F while minimizing α and maximizing M S , ultimately leading to lower J c0 while maintaining high thermal stability. Bottom-pinned MRAM cells with device diameter in the range of 55-130 nm were fabricated, and J c0 is lowest for the thinnest (1.2 nm) FLs, down to 4 MA/cm 2 for 65 nm devices, ∼30% lower than 1.7 nm FLs. The thermal stability factor ∆ dw , as high as 150 for the smallest device size, was determined using a domain wall reversal model from field switching probability measurements. With high ∆ dw and lowest J c0 , the thinnest FLs have the highest spin-transfer torque efficiency.