2019
DOI: 10.1016/j.actamat.2019.05.044
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Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition

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Cited by 30 publications
(30 citation statements)
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“…In Figure 5, detailed elemental maps collected from a representative nanolamellar region with cubic grains within the p-coating are presented. Al, Ti, and Cl maps and a line scan indicate a periodic variability in the composition of Al(Ti)N-Ti(Al)N bi-layers filling the cubic grains, as already discussed elsewhere [9,15]. In other words, the concentrations of Al and Ti change in an oscillatory fashion across the nanolamellar grains and the bilayers are non-stoichiometric [9].…”
Section: Chemical and Structural Analysis Of The Nanolamellaesupporting
confidence: 57%
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“…In Figure 5, detailed elemental maps collected from a representative nanolamellar region with cubic grains within the p-coating are presented. Al, Ti, and Cl maps and a line scan indicate a periodic variability in the composition of Al(Ti)N-Ti(Al)N bi-layers filling the cubic grains, as already discussed elsewhere [9,15]. In other words, the concentrations of Al and Ti change in an oscillatory fashion across the nanolamellar grains and the bilayers are non-stoichiometric [9].…”
Section: Chemical and Structural Analysis Of The Nanolamellaesupporting
confidence: 57%
“…We are aware of the possibility that the increasing of the working temperature during deposition process may have affected already deposited sublayers. On the other hand, so far published results on thermal stability [11,15] has shown only slight changes in the temperature interval, which was selected in our study (750-860 • C). Therefore, we do not expect trends observed in our study to be significantly affected by our deposition strategy.…”
Section: Properties Of T-coatingmentioning
confidence: 98%
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“…Due to the respectable mechanical properties like high hardness, anti-corrosion, and superior oxidation resistance, Ti-Ai-N has attracted much attraction in dry and high speed cutting as the surface protection films for machine tools [1][2][3]. Nowadays, varieties of techniques have been developed for the fabrication of Ti-Al-N films including chemical vapor deposition [4], arc evaporation [5], ion plating [6], and reactive DC/RF sputtering [7]. During Ti-Al-N film deposition progress, the gas atmosphere is quite important and complex [8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%