2000
DOI: 10.1002/1521-3862(200011)6:6<311::aid-cvde311>3.0.co;2-n
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Thermal Stability of Pb(C11H19O2)2 Used as the Lead Source in MOCVD

Abstract: The thermal stability of lead bisdipivaloylmetanate [Pb(C 11 H 19 O 2 ) 2 ], used as a Pb source for the organometallic precursor in the metal±organic chemical vapor deposition MOCVD preparation of Pb-based ferroelectric films, was investigated. Using thermogravimetry differential thermal analysis (TG-DTA), with a heating rate of 10 K min ±1 and nitrogen as the carrier gas, the as-received specimen showed endothermic peaks at 132 C, and complete evaporation by 300 C. Isothermal mass loss analysis showed that,… Show more

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Cited by 5 publications
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“…This technique has been shown to be very fruitful to identify, sometimes in conjunction with a thermodynamic study, the intermediate species playing the role of the effective precursors of the solid deposited, e.g. pyrocarbon [19] , diamond [22] , silicon [23] , silicon carbide [24][25][26] , boron carbide [8] and various oxides SnO2 [27] , BaSrTiO3 [28] , Pb (Zr, Ti) O3 [29] . For the present study of both the B-C and Si-B-C systems, correlations are reported between (1) in-situ FTIR gas phase analysis, (2) characterization of the coatings, (3) kinetic study and, as a conclusion, the various chemical processes possibly involved are discussed.…”
Section: Introductionmentioning
confidence: 99%
“…This technique has been shown to be very fruitful to identify, sometimes in conjunction with a thermodynamic study, the intermediate species playing the role of the effective precursors of the solid deposited, e.g. pyrocarbon [19] , diamond [22] , silicon [23] , silicon carbide [24][25][26] , boron carbide [8] and various oxides SnO2 [27] , BaSrTiO3 [28] , Pb (Zr, Ti) O3 [29] . For the present study of both the B-C and Si-B-C systems, correlations are reported between (1) in-situ FTIR gas phase analysis, (2) characterization of the coatings, (3) kinetic study and, as a conclusion, the various chemical processes possibly involved are discussed.…”
Section: Introductionmentioning
confidence: 99%