Thermal stability of TiZrAlN films deposited by a reactive magnetron sputtering method

Abstract

Quaternary TiZrAlN films are: • perspective for both oxidation and wear resistance applications and expectant substitution for TiN, (Ti,Al)N and (Ti,Zr)N hard films; • capable to possess by the unique properties due to possibility of nanocomposite structure formation during their synthesis. The aim of the present work is to study the thermal stability, under vacuum and air annealing, of quaternary transition metal nitride films, namely (Ti,Zr)1-xAlxN, with emphasis on the role of Al content on the structure and phase formation.