The goal of this study is to determine how bulk vibrational
properties
and interfacial structure affect thermal transport at interfaces in
wide band gap semiconductor systems. Time-domain thermoreflectance
measurements of thermal conductance
G
are reported
for interfaces between nitride metals and group IV (diamond, SiC,
Si, and Ge) and group III–V (AlN, GaN, and cubic BN) materials.
Group IV and group III–V semiconductors have systematic differences
in vibrational properties. Similarly, HfN and TiN are also vibrationally
distinct from each other. Therefore, comparing
G
of
interfaces formed from these materials provides a systematic test
of how vibrational similarity between two materials affects interfacial
transport. For HfN interfaces, we observe conductances between 140
and 300 MW m
–2
K
–1
, whereas conductances
between 200 and 800 MW m
–2
K
–1
are observed for TiN interfaces. TiN forms exceptionally conductive
interfaces with GaN, AlN, and diamond, that is,
G
> 400 MW m
–2
K
–1
. Surprisingly,
interfaces formed between vibrationally similar and dissimilar materials
are similarly conductive. Thus, vibrational similarity between two
materials is not a necessary requirement for high
G
. Instead, the time-domain thermoreflectance experiment (TDTR) data,
an analysis of bulk vibrational properties, and transmission electron
microscopy (TEM) suggest that
G
depends on two other
material properties, namely, the bulk phonon properties of the vibrationally
softer of the two materials and the interfacial structure. To determine
how
G
depends on interfacial structure, TDTR and
TEM measurements were conducted on a series of TiN/AlN samples prepared
in different ways. Interfacial disorder at a TiN/AlN interface adds
a thermal resistance equivalent to ∼1 nm of amorphous material.
Our findings improve fundamental understanding of what material properties
are most important for thermally conductive interfaces. They also
provide benchmarks for the thermal conductance of interfaces with
wide band gap semiconductors.