2022
DOI: 10.1140/epjb/s10051-021-00265-x
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Thermally activated diffusion of impurities along a semiconductor layer

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Cited by 3 publications
(4 citation statements)
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“…Due to this potential profile, the impurities accumulated around the potential minimum. When the nonhomogeneous temperature added to the system, which is position dependent, that can be expressed as [20] T x T…”
Section: The Quartic Potentialmentioning
confidence: 99%
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“…Due to this potential profile, the impurities accumulated around the potential minimum. When the nonhomogeneous temperature added to the system, which is position dependent, that can be expressed as [20] T x T…”
Section: The Quartic Potentialmentioning
confidence: 99%
“…In the field of semiconductor physics has received a considerable attention due to the problem of how to adjust the conductivity of the semiconductor by adding the impurities into their crystal lattice and manipulating the level of conductivity on the type and amount of impurities. Recent studies showed that the conductivity of the semiconductor is controlled by also changing the strength of the background temperature along the semiconductor layer [15][16][17][18][19][20][21][22][23][24][25]. The background temperature in a semiconductor affects the concentration and diffusivity of impurities which are responsible for conduction.…”
Section: Introductionmentioning
confidence: 99%
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