2005
DOI: 10.1007/s11664-005-0106-5
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Thermally stimulated current spectroscopy of high-purity semi-insulating 4H-SiC substrates

Abstract: High-purity semi-insulating (HPSI) 4H-SiC has been widely used as a substrate material for AlGaN/GaN high electron-mobility transistors because of its fairly good lattice match with GaN and its high thermal conductivity. To control material quality, it is important to understand the nature of the deep traps. For this purpose, we have successfully applied thermally stimulated current (TSC) spectroscopy to investigate deep traps in two HPSI 4H-SiC samples grown by physical vapor transport (PVT) and high-temperat… Show more

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Cited by 30 publications
(24 citation statements)
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“…13,14 Such an assignment complies with TSC studies of SI 4H-SiC (Ref. 10) where Al related trap with E a ¼ 0.22 eV was peaked at 105 K. We have tentatively assigned peak C at $242 K (E a ¼ 0.57 eV) to the Z 1/2 center. 10,13,14 Although the reported activation energy of Z 1/2 center (0.63-0.68 eV) and the typical peak temperature are somewhat higher than that for peak C, this is the only electron trap candidate for this peak that we were able to find in the published literature.…”
supporting
confidence: 87%
“…13,14 Such an assignment complies with TSC studies of SI 4H-SiC (Ref. 10) where Al related trap with E a ¼ 0.22 eV was peaked at 105 K. We have tentatively assigned peak C at $242 K (E a ¼ 0.57 eV) to the Z 1/2 center. 10,13,14 Although the reported activation energy of Z 1/2 center (0.63-0.68 eV) and the typical peak temperature are somewhat higher than that for peak C, this is the only electron trap candidate for this peak that we were able to find in the published literature.…”
supporting
confidence: 87%
“…TSC is useful for identifying compensated traps and other defect levels in semi-insulating material. 14 The ionized traps are filled at low temperature by white light illumination then emptied by a temperature scan in the dark during which variations in the current indicate the presence of traps. The TSC temperature scan for the semi-insulating sample is shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…3(a)) can be attributed to the well known boron related D-center. 12,18,21 The TSC measurements at 0 V bias revealed one more trap center peaked at $400 K (peak 7 in Fig. 3(b)).…”
Section: Resultsmentioning
confidence: 98%
“…This trap center has a peak temperature of $140 K and had an activation energy close to that reported for shallow boron. 12 However, its independence on the bias voltage suggests that this peak represents the trap center at the Ni/SiC interface. The weak peak 4 at $175 K can be caused by the HS1, D I , and HH1 centers 12,19,20 with an activation energy of $0.35 eV.…”
Section: Resultsmentioning
confidence: 99%
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