Dielectric breakdown of metal-insulator-metal ͑MIM͒ diodes can result in the development of voltage-controlled negative resistance ͑VCNR͒ in the current-voltage ͑I-V͒ characteristics. Electroluminescence from the MIM diode appears at the same time as VCNR develops. The spectra of electroluminescence associated with VCNR of Al-Al 2 O 3 -Au diodes with anodic Al 2 O 3 has been measured for photon energies between 1.8 eV, the lowest photon energy the photomultiplier can detect, and 3.4 eV, using narrow-band interference filters. Electroluminescent photons have maximum intensity between 1.8 and 2.4 eV with a peak at ϳ2.2 eV. The voltage threshold for electroluminescence in Al-Al 2 O 3 -Au diodes, V TH , is 1.7 to 2.0 V; it is associated with an impurity band in amorphous Al 2 O 3 . Electrons injected into the impurity band can recombine with radiative centers in Al 2 O 3 or can be emitted into vacuum. The range of values of V TH is the same as the range of values of the barrier height at the Al-Al 2 O 3 interface measured by internal photo emission or by tunneling. The spectral data support a model of conduction and VCNR in a conducting channel. Dielectric breakdown and forming of VCNR introduce positive charge at the Al-Al 2 O 3 interface that results in an Ohmic contact and a high field region in the conducting channel. Electrons injected into Al 2 O 3 when the applied voltage is greater than V TH neutralize positive charge, change the Ohmic contact, and cause a decrease in current with increasing voltage. The radiative centers involved in electroluminescence are also responsible for other forms of luminescence in Al 2 O 3 .