Ceramic Transactions Series
 2010
DOI: 10.1002/9780470909836.ch6
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Thermodynamic Calculations of ZrC‐SiC System for Chemical Vapor Deposition Applications from SiCl 4 ‐ZrCl 4 ‐CH 4 ‐H 2

Qiaomu Liu
1
,
Litong Zhang
2
,
Yiguang Wang
3
et al.
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