Abstract:Thin films of boron carbide (B 12+x C 3-x ) were prepared on glass substrates by a pulsed ion-beam evaporation method. A pulsed proton beam with an energy of 1 MV (peak) and a current of 60 kA was focused on sintered B 12+x C 3-x targets. Ablation plasma was formed from the irradiated targets and thin films were prepared on Pyrex and SiO 2 glass substrates at room temperature. From results of X-ray diffraction, the thin films consisted of a B 12+x C 3-x phase. Using a known relationship between the composition… Show more
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