2013
DOI: 10.1557/jmr.2013.163
|View full text |Cite
|
Sign up to set email alerts
|

Thermoelectric properties of Ca3Co4O9 and Ca2.8Bi0.2Co4O9 thin films in their island formation mode

Abstract: Ca3Co4O9 and Ca2.8Bi 0.2Co4O9 thin films were fabricated on LaAlO3 (LAO) substrate using pulsed laser deposition technique and were studied for their thermoelectric (TE) properties in Stranski-Krastanov mode for the first time. The thin films consisted of 3D clusters/islands on a 14-nm thick 2D layer with cluster density being higher for Ca 2.8Bi0.2Co4O9 thin films. The clusters also represent areas of dislocation and therefore act as carrier scattering centers, which leads to a temperature-activated type cond… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
1
1

Year Published

2014
2014
2024
2024

Publication Types

Select...
4
2
1

Relationship

0
7

Authors

Journals

citations
Cited by 13 publications
(2 citation statements)
references
References 32 publications
0
1
1
Order By: Relevance
“…32, 8 • 10 −16 s. Expressed in a different way, we find σ/τ to be given by ≃ 0.37 • 10 15 (mΩ • cm • s) −1 , which is by about a factor of four larger than the corresponding value of Lemal et al [32]. Note, however, that the reported resistivities vary considerably, ranging from ≃ 2 for single crystals [5] to ≃ 170 mΩ • cm for thin films fabricated on an LAO substrate using the PLD technique [22]. Another group, also using PLD but on (001)-silicon with a thin epitaxial yttria-stabilized zirconia (YSZ) buffer layer, reports ≃ 2 − 13 mΩ • cm, depending on the microstructure [25].…”
Section: Discussioncontrasting
confidence: 59%
“…32, 8 • 10 −16 s. Expressed in a different way, we find σ/τ to be given by ≃ 0.37 • 10 15 (mΩ • cm • s) −1 , which is by about a factor of four larger than the corresponding value of Lemal et al [32]. Note, however, that the reported resistivities vary considerably, ranging from ≃ 2 for single crystals [5] to ≃ 170 mΩ • cm for thin films fabricated on an LAO substrate using the PLD technique [22]. Another group, also using PLD but on (001)-silicon with a thin epitaxial yttria-stabilized zirconia (YSZ) buffer layer, reports ≃ 2 − 13 mΩ • cm, depending on the microstructure [25].…”
Section: Discussioncontrasting
confidence: 59%
“…The results are expected to be applicable for not too low temperature, T > ∼ 200 K. In order to explain the measured room-temperature resistivity [4], we have chosen the relaxation time to be given by 3 [32]. Note, however, that the reported resistivities vary considerably, ranging from ≃ 2 for single crystals [5] to ≃ 170 mΩ · cm for thin films fabricated on an LAO substrate using the PLD technique [22]. Another group, also using PLD but on (001)-silicon with a thin epitaxial yttria-stabilized zirconia (YSZ) buffer layer, reports ≃ 2 − 13 mΩ · cm, depending on the microstructure [25].…”
Section: Discussionmentioning
confidence: 99%