“…The optimal annealing temperature of AZO is between 400 and 500 °C 7, 8 and it is strictly limited to optical applications, such as LCDs, plasma display panels (PDP), and solar cell applications 9. Many researches have reported the effect of other different dopings, other than the Al‐doping, in the AZnO thin films, such as, Y, B, V, Ni, Ru, Cr, V, Ga, and Mn 10–21. However, the optimum annealing temperatures for the above doped AZO thin films are still considerably high 11, 15, 16.…”